Imaging with x-ray nanobeams is rapidly developing area at synchrotron radiation and x-ray free-electron laser facilities around the world. The unique quality of x-ray nanobeam imaging is the opportunity for direct in-situ and in-operandi experiments exploring very challenging physical environments and giving direct correlation between structure and physical properties

KTH focuses on the design and manufacturing of diffractive zone plate optics, with diffraction-limited resolution in the 10 - 100 nm range, for nanobeam imaging in the soft and hard x-ray range. The fabrication is carried out by electron beam lithography and high aspect ratio etching based processes.

Keywords: X-ray optics; Manufacturing; Electron beam lithography; Nanofabrication