Nanofabrication with focused ion and electron beams SK3750

This course is given on an as-needed basis, typically spring term, every other year.

link to password protected page

Schedule for 2018 run of course:

All 5 lectures will be in Applied physics seminar room A2:1041, Albanova, Roslagstullsbacken 21. 

  1. Wednesday May 2, 13:00 -15:00. David Haviland - Electron Beam lithography basics
  2. Tuesday May 8, 13:00 -15:00 . Anders Liljeborg - 1st run, EBL demo in lab, specifics of the new Raith Voyger System
  3. Wednesday May 9, 13:00 -15:00 . Anders Liljeborg - 2nd run, EBL demo in lab, specifics of the new Raith Voyger System (overflow, same as 2)
  4. Tuesday May 15 , 13:00 - 15:00. Andreas Rydh - Micromanipulator with focused ion and electron beams
  5. Wednesday May 16, 13:00 - 15:00. David Haviland - Students present project planr, discussion, training groups.

Course Description:

The course is designed for Masters, PhD students and researchers who will use Electron Beam Lithography (EBL) or Focused Ion Beam (FIB) in the Albanova Nanolab. The course consists of 5 x 2 hours of lectures given in one week. Lectures will cover the basic principles of EBL and FIB, as well as the principles of Scanning Electron Microscopy (SEM). They will also give an overview of the specific machines which we have in the Albanova NanoLab. On the final lecture day, students will make short presentations of their nanofabrication projects with EBL and FIB for the class. These presentations will lead in to a discussion of how best to make the structure, and what techniques are best to learn in the training sessions.

Those students who wish to become users will attend all the lectures and then take more extended training. Even if you have already had initial training at the consol of the EBL or SEM/FIB system, we ask that you take this course to gain a broader overview of the methods and to refresh your skills and understanding. Instruction at the console of the EBL and FIB systems will take place in smaller groups. Students will begin by looking over the shoulder of experienced users while they expose their patterns. Eventually students will operate the SEM/FIB and or EBL system to fabricate and image their own strucure. Those students wishing to get a drivers license to use the machine themselves, will continue to gain more training with experienced users. A drivers license will be granted if the lab manager feels that a sufficient level of competence has been achieved. It is not automatic that you will be granted a drivers license after successful completion of the course.

In this course we will focus on the beam exposure part of nanofabrication, and not on any subsequent metalization, etching, or prior material growth. Development of any special substrate material, or the development of a special etching processes required for the students project are not within the scope of this course. For EBL, the NanoLab has a few standard resists and the necesary developers to do high resolution work. 

The lecture part of the course is open to everyone. The training part of this course is restricted to paying users of the Albanova Nanolab. If you would like to take the course, but you are not interested in becoming a user, it is possible to attend the lectures and work on an independent study project, researching the literature and writing a report in order to gain credits. You should state your intentions when you register for the course (see below).

Requirements:

Satisfactory completion of the course requires that you:

  • Attend all the lectures
  • For students training to become users:
    • Attend the training sessions and learn to use the system.
    • Successfully write your pattern and examine it in the SEM mode, taking pictures.
    • Prepare a short report describing your project. The report should be about 5 pages total. It should include a short introduction to your project, and motivation for using e-beam lithography. You should describe your process (the e-beam part) and include "recipe" information about the resist, the exposure parameters. You should include pictures SEM and optical microscope pictures of your results. Give a discussion of problems encountered. Especially important is to point to information about new techniques and recipes which are useful for future users. The report should be turned in PDF or HTML format so that it is suitable for posting in our web-based process archive.
  • For students who will not become users:
    • Discuss with the lecturer to find a suitable topic for independent study.
    • Research the topic and write a report. Your report should be some 10 pages, with text and figures. It should require significant research of recent scientific and technical literature relating to e-beam lithography or Nano-Fabarication methods. Some example topics are: Nano Fabrication with Focused Ion Beams. 3D patterning methods with beam writing.Chemical assisted e-beam or ion beam writing.

Pre-requisites:

Good general science or technical education. Advanced level courses are not necessary to understand the basic ideas. A good sense for physical apparatus and computer interfaces are needed to properly use these rather complex systems.

Course Literature:

Lecture notes and material will be made available to students taking the course through the link below.

link to password protected page

Registration:

If you are interested in this course please contact Prof. David Haviland. Include in your e-mail message:

  • Your name, address, phone, and e-mail.
  • The name of your research advisor who will pay the nanolab fee (if you take the training part).
  • Your department, Section, School etc. and or University.
  • A couple of sentences describing why you wnat to take the course.
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